Magnetics

TRM-Bar™
mQRM-Bar™
and QRM-Bar™

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SRM-Bar™

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SCI TRM-Bar™, SRM-Bar™, QRM-Bar™ and mQRM-BarTM magnetics give you the flexibility you need. Provided with encapsulated magnets, magnet assemblies are adaptable to fit your process requirements.

SCI advanced sputtering magnetic system features include the following:

  • Multiple magnetic designs to fit your application requirements
  • Advanced magnetics designed using 3D finite element analysis software
  • Carefully matched, hi-strength magnets that are factory calibrated using an automated magnet bar measurement tool
  • Fully encapuslated magnets and robust construction for many years of trouble-free operation
  • Long-life, multi-roller system for sputter up, sputter down or off-angle sputtering
  • Magnetic uniformity adjustments that can be done easily in the field
  • A simple installation procedure with solutions for vertical installations

The SCI RAM-Bar™ allows customers to adjust the distance between the sputtering magnet pack and the target surface from outside the system - during operation.

TRM-Bar™
mQRM-Bar™
and QRM-Bar™

Download Datasheet


SRM-Bar™

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Features

 TRM-Bar™

  • Industry-proven design with thousands of bars currently in operation
  • High rate reacive mode or metal mode sputtering of optical grade films

mQRM-Bar™

  • Small magnet 4-row design increases strength by 50% over the TRM
  • No plasma-forming fringe field
  • Lower impedance than the TRM

QRM-Bar™

  • Stronger "patent pending" magnetics for low impedance sputtering of TCOs and other electrical grade films
  • Increased sputtering efficiencies reduce power consumption and operating costs

SRM-Bar™

  • High-strength magnets that are hermetically sealed
  • Advanced magnetics designed using 3D finite element analysis software
  • Magnet are matched in strength within 1%
  • Large magnet, single row design
  • Easily installed in any possible orientation
Benefits

TRM-Bar™

  • Narrow deposition profile minimizes coating losses to waste shields
  • Multiple turn-around designs for different application requirements.  The turn-arounds can be easily changed

mQRM-Bar™

  • Target materials 170mm or less that require high utilization
  • Processes that require lower impedance and are more stable over the lifetime of the target material: reactive sputtering, ITO
  • Applications for smaller sputter angles

QRM-Bar™

  • Lower impedance plasma enables higher power densities and higher achievable sputter rates for most materials
  • Increased process stability over the life-time of the target material

SRM-Bar™

  • 5-year limited warranty
  • Superior target utilization and reduced cross-corner effects
  • Industry leading magnetic uniformity up to +/- 1%
  • Narrow deposition profile minimizes coating loss to shield
  • Lengthen your campaigns by decreased downtime and increased productivity
  • Adjustable sputter angle when used with our CM-Series™ external end block

TRM-Bar™
mQRM-Bar™
and QRM-Bar™

Download Datasheet


SRM-Bar™

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Utilization

TRM-Bar™ w/152mm OD Target: >70%
TRM-Bar™ w/152mm Dogboned Target: >80%
TRM-Bar™  High Utilization w/152mmOD Target - Up to 90%

mQRM-Bar™ w/170mm OD Target:>85%

QRM-Bar™ w/155mm OD: >85%
QRM-Bar™ w/165mm Target OD: >75%

SRM-Bar™ with 100mm OD target >85%

Uniformity

See SCI's Uniformity Calculator

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