RF Sputtering of ITO on Rotary Cathodes presentation given at SVC

Sputtering Components proudly recognizes John German and Russ Lovro for their contributions to a successful and informative presentation at the Society of Vacuum Coaters Conference in Chicago, Illinois on May 5^th, 2014. 

The presentation was titled “RF Sputtering of ITO on Rotary Cathodes.” A similar presentation will be given at the upcoming Power Electronics for Plasma Engineering Conference in Warsaw, Poland on May 22^nd.  This event is being sponsored by TRUMPF Hüttinger.

Topics in this presentation included the following:

• Combining RF and DC power to ITO sputtering processes to improve film properties (compared to DC sputtering only)
• Rotary target sputtering and the economic and processing advantages over planar targets
• Combining the advantages of RF and DC power with rotary cathodes to optimize cost and performance of ITO films.