SCI announces release of Swing Cathode™
SCI is proud to announce the release of its new Swing Cathode™ rotary magnetron. This is the first rotary magnetron in the SCI product portfolio that is specifically designed to coat large area static substrates. The swing cathode™ is uniquely suited for this application because the rotation;angle of the magnet pack inside the target tube is controlled using a servo motor.
Using an array of Swing Cathodes the velocity profile and travel angles of the;magnet pack can be customized to produce uniform coatings across the surface;of large area static substrates. This design allows customers to utilize rotary cathodes on applications that have such stringent particulate and defect limitations that they cannot transport the substrate during the deposition process.
The replacement of planar magnetrons with Swing Cathode™ rotary magnetrons in applications such as flat panel display can dramatically improve production by doing the following:
- Increasing the time between target changes
- Increasing target material volume per cathode
- Reducing target material costs by increasing the target material utilization
- Reducing power consumption costs due to lower impedance and higher efficiency sputtering
- Increasing product throughput time due to higher deposition rates
- Increasing coating uniformity since the deposition profile is controllable
- Reducing defect generation since rotary magnetrons are not as prone to nodule growth or arcing
The Swing Cathode™ rotary magnetron provides customers with a faster, cheaper, and cleaner solution for coating large area static substrates over planar magnetrons. For more information on this product contact your SCI representative or visit the product web page.
