Swing-DUO™ software demo video now avialable

Sputtering Components has released a demonstration video for the Swing-DUO™ (Dynamic Uniformity Optimization) software - now available on YouTube: http://youtu.be/dQfQ3Pi_8cE

The demonstration video provides an example of the software’s input criteria, output data including a motion profile and a cam table that can be used to program the Swing Cathode’s servos.

The motion profile used to control the magnet bar movement is a function of the array geometry and can be simulated and optimized for customer-specific geometries. Some of the software inputs include number of cathodes used, cathode spacing, substrate width, target material dimensions, and type of magnet bar used.

An optimized array of standard rotary magnetrons will meet or exceed the uniformity requirements of many processes, but still does not address the target profile changes as the target materials wears away.  SCI customers will have the ability to adjust the motion profile to accommodate this erosion. In addition the customers can put the actual measured film uniformity back into the program and simulate a motion profile that can correct for uniformity issues.

In order to access the software, SCI customers must be registered as a member on the Sputtering Components website. If you are not registered, go to the member page to request approval. 

Once your membership is approved, the software may be access through a secure site at http://swingduo.sputteringcomponents.com/login.

For more information, visit our website or contact us at sales@sputteringcomponents.com.